Mapping of properties of thin plasma jet films using imaging spectroscopic reflectometry
| Autoři | |
|---|---|
| Rok publikování | 2014 |
| Druh | Článek v odborném periodiku |
| Časopis / Zdroj | MEASUREMENT SCIENCE & TECHNOLOGY |
| Fakulta / Pracoviště MU | |
| Citace | |
| www | http://iopscience.iop.org/0957-0233/25/11/115201/pdf/0957-0233_25_11_115201.pdf |
| Doi | http://dx.doi.org/10.1088/0957-0233/25/11/115201 |
| Obor | Fyzika pevných látek a magnetismus |
| Klíčová slova | imaging spectrophotometry; micro-plasma jet; non-uniform thin films; optical properties; thickness mapping |
| Přiložené soubory | |
| Popis | The construction of a normal-incidence imaging spectrophotometer for mapping of thin film properties is described. It is based on an on-axis reflective imaging system, utilising a telescope-like arrangement. A charge-coupled device camera is used as the detector, permitting measurements in the spectral range of 275-1100 nm with resolution of 37 mu m. The performance of the instrument is demonstrated by optical characterisation of highly non-uniform thin films deposited from hexamethyldisiloxane on silicon substrates by a single capillary plasma jet at atmospheric pressure. The imaging spectrophotometry is used as a self-sufficient technique for the determination of both the film optical constants and maps of local thickness. The thickness maps are compared with the results of conventional thickness profile characterisation methods, profilometry and atomic force microscopy and the differences and errors are discussed. |
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