Optical characterization of inhomogeneous thin films with randomly rough boundaries

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Publikace nespadá pod Filozofickou fakultu, ale pod Přírodovědeckou fakultu. Oficiální stránka publikace je na webu muni.cz.
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VOHÁNKA Jiří OHLÍDAL Ivan BURŠÍKOVÁ Vilma KLAPETEK Petr KAUR Nupinder Jeet

Rok publikování 2022
Druh Článek v odborném periodiku
Časopis / Zdroj Optics Express
Fakulta / Pracoviště MU

Přírodovědecká fakulta

Citace
www https://opg.optica.org/oe/fulltext.cfm?uri=oe-30-2-2033&id=467886
Doi http://dx.doi.org/10.1364/OE.447146
Klíčová slova polymer; thin film; single-crystal substrate; silicon
Popis An inhomogeneous polymer-like thin film was deposited by the plasma enhanced chemical vapor deposition onto silicon single-crystal substrate whose surface was roughened by anodic oxidation. The inhomogeneous thin film with randomly rough boundaries was created as a result. This sample was studied using the variable-angle spectroscopic ellipsometry and spectroscopic reflectometry. The structural model including the inhomogeneous thin film, transition layer, and identically rough boundaries was used to process the experimental data. The scalar diffraction theory was used to describe the influence of roughness. The influence of the scattered light registered by the spectrophotometer due to its finite acceptance angle was also taken into account. The thicknesses and optical constants of the inhomogeneous thin film and the transition layer were determined in the optical characterization together with the roughness parameters. The determined rms value of the heights of roughness was found to be in good agreement with values obtained using AFM. The results of the optical characterization of the studied inhomogeneous thin film with rough boundaries were also verified by comparing them with the results of the optical characterization of the inhomogeneous thin film prepared using the same deposition conditions but onto the substrate with a smooth surface.
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