Evolution of discharge current in high power impulse magnetron sputtering

Warning

This publication doesn't include Faculty of Arts. It includes Faculty of Science. Official publication website can be found on muni.cz.

Authors	FEKETE Matej VAŠINA Petr KLEIN Peter
Year of publication	2013
Type	Article in Proceedings
Conference	PAPN 2013: Book of extended abstracts
MU Faculty or unit	Faculty of Science
Citation
Field	Plasma physics
Keywords	HiPIMS; discharge current; magnetron sputtering; optical emission spectroscopy
Description	High power impulse magnetron sputtering (HiPIMS) is nowadays often discussed topic. Physics of HiPIMS discharge is not completely understand yet. Even very basic characteristics of HiPIMS discharge like time resolved dependence of the cathode voltage and the discharge current are still discussed and interpreted. This research shows different regimes of time evolution of the discharge current depending on applied target voltage. Possible interpretation is presented.
Related projects:	CEPLANT - Regionální VaV centrum pro nízkonákladové plazmové a nanotechnologické povrchové úpravy Porozumění hybridnímu PVD-PECVD procesu s cílem řídit růst nanostrukturovaných kompozitních vrstev