Surface chemistry and initial growth of Al2O3 on plasma modified PTFE studied by ALD
| Authors | |
|---|---|
| Year of publication | 2017 |
| Type | Article in Periodical |
| Magazine / Source | Surfaces and Interfaces |
| MU Faculty or unit | |
| Citation | |
| Web | http://www.sciencedirect.com/science/article/pii/S2468023016300529 |
| Doi | http://dx.doi.org/10.1016/j.surfin.2016.10.005 |
| Field | Plasma physics |
| Keywords | Atomic layer deposition; Nucleation; Plasma pre-treatment; Diffuse coplanar surface barrier discharge; PTFE |
| Description | An atmospheric-pressure DCSBD plasma in ambient air was used to clean and activate PTFE surfaces before low-temperature atomic layer deposition of Al2O3. It emerged that the fastest nucleation, leading to complete Al2O3 films, took place on PTFE samples that had been treated by plasma that led to the highest concentration of oxygen-containing functional groups. This condition required that some carbon contamination remained on the surface. Complete removal of surface carbon contamination to leave a surface close to stoichiometric PTFE was not beneficial from a film nucleation point of view, due to its lack of active nucleation sites. The results show that DCSBD treatment of PTFE in ambient air is an effective method of controlling and enhancing the nucleation process of thin films deposited by ALD on this substrate material. |
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