NITROGEN DOPED ORGANOSILICON PLASMA POLYMERS FOR BIOAPPLICATIONS

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Authors	BITTNEROVÁ Štěpánka BURŠÍKOVÁ Vilma STUPAVSKÁ Monika
Year of publication	2016
Type	Conference abstract
MU Faculty or unit	Faculty of Science
Citation
Description	The aim of the present work was to prepare organosilicon thin films with amine functionalities on single crystalline silicon substrates using plasma enhanced chemical 81 vapor deposition (PECVD). The film properties prospective for bioapplications (surface free energy, resistance against mechanical damage, chemical composition, i.e. the presence of primary and secondary amines) were studied.
Related projects:	Rozvoj centra pro nízkonákladové plazmové a nanotechnologické povrchové úpravy