Plasma enhanced chemical vapor deposition of organosilicon thin films on electrospun polymer nanofibers
| Authors | |
|---|---|
| Year of publication | 2013 |
| Type | Article in Proceedings |
| Conference | Book of Contributed Papers: 19th Symposium on Application of Plasma Processes |
| MU Faculty or unit | |
| Citation | |
| Web | http://neon.dpp.fmph.uniba.sk/sapp |
| Field | Plasma physics |
| Keywords | PECVD; organosilocon layers; nanofibers |
| Description | Organosilicon plasma polymers were prepared from hexamethyldisiloxane / argon mixtures in low pressure rf discharges with capacitive coupling and by cold rf plasma multi-jet working at atmospheric pressure. The frequency of applied voltage was in both cases 13.56 MHz. The films were prepared on PVA and PA6 electrospun fabrics and on silicon and glass substrates for reference purposes. The coatings were characterized by scanning electron microscopy (SEM), Fourier transform infrared spectroscopy, atomic force microscopy and contact angle measurement. SEM revealed that the microstructure of coatings differed significantly when changing the plasma conditions. |
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