Effect of the Discharge Conditions on the Mechanical Properties of the Plasma Deposited DLC:SiOx Films

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Authors	BURŠÍKOVÁ Vilma DVOŘÁK Pavel ZAJÍČKOVÁ Lenka KLAPETEK Petr BURŠÍK Jiří JANČA Jan
Year of publication	2003
Type	Article in Proceedings
Conference	Proceedings of SAPP XIV
MU Faculty or unit	Faculty of Science
Citation
Field	Plasma physics
Keywords	discharge conditions; mechanical properties; plasma deposited films
Description	Hard diamond like carbon films with insorporation of SiOx were deposited from mixture of methane and HMDSO. The Hardness, elastic modulus, interfacial fracture toughness and their dependence on the HMSDO to methane ratio were studied. The correlation between the discharge parameters and the film properties was determined.
Related projects:	Plasmachemical depositions and plasmachemical treatment of surfaces of solid state substrate Optical and mechanical properties of DLC : Si thin films prepared by the PECVD method Study of plasmachemical reactions in non-isothermic low pressure plasma and its interaction with the surface of solid substrates