Deposition of polymer films by rf discharge at atmospheric pressure
| Authors | |
|---|---|
| Year of publication | 2004 |
| Type | Article in Periodical |
| Magazine / Source | Czech. J. Phys. |
| MU Faculty or unit | |
| Citation | |
| Field | Plasma physics |
| Keywords | deposition of films; rf discharge; plasma diagnostics |
| Description | RF plasma nozzle at atmospheric pressure has been used for deposition of thin films. The mechanical properties of deposited films were studied using indentation technique. Special properties of RF discharges offer hopeful technological applications like deposition of thin solid films. The parameters of the plasma were investigated by spectral and optical methods. The powered RF electrode of the torch discharge plasma source is made from the metal or dielectric pipe with an inner diameter of 1 - 2 mm and with a length of several centimeters. The electrode is connected through the matching unit to the RF generator driven at the frequency of 13.56 MHz. The mixture of argon and n-hexane or HMDSO (hexamethyldisiloxane, C6H18Si2O) gas ows through the RF electrode at the pipe. Polymer films were deposited on the several substrates e.g. glass, brass polished plates and Si wafers. |
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