Optical Emission Spectroscopy in HMDSO/O2 RF Glow Discharge

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Authors

ŠMÍD Radek ZAJÍČKOVÁ Lenka

Year of publication 2005
Type Article in Proceedings
Conference WDS'05 Proceedings of Contributed Papers, Part II
MU Faculty or unit

Faculty of Science

Citation
Web http://www.mff.cuni.cz/veda/konference/wds/contents/wds05.htm
Field Plasma physics
Keywords Optical emission spectroscopy; hexamethyldisiloxane; oxygen; deposition
Description We applied optical emission spectroscopy to study HMDSO/O2 plasmas and detected emission lines and bands related to CO, CO2+, OH, CH, H, H2, O, N2 as an impurity and Ar as an actinometer. We have observed only very low emission of Si and SiO. With increasing rf power the increasing concentration of electrons probably caused increasing intensity of emission. This was confirmed for the concentration of oxygen radicals by actinometry. The changes of HMDSO fraction have much more significant influence on the gas phase composition. The oxygen containing molecules (CO, OH) show the same trend on the HMDSO fraction with a maximum at 0.16. The CH and H species show also similar trends to each other with the maximum at 0.28. It is interesting to notice that this trend was not observed for H2 molecule which intensity increase constantly with the HMDSO fraction. The oxygen atomic line, on the other hand, decreased.
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