Optical Emission Spectroscopy in HMDSO/O2 RF Glow Discharge
| Authors | |
|---|---|
| Year of publication | 2005 |
| Type | Article in Proceedings |
| Conference | WDS'05 Proceedings of Contributed Papers, Part II |
| MU Faculty or unit | |
| Citation | |
| Web | http://www.mff.cuni.cz/veda/konference/wds/contents/wds05.htm |
| Field | Plasma physics |
| Keywords | Optical emission spectroscopy; hexamethyldisiloxane; oxygen; deposition |
| Description | We applied optical emission spectroscopy to study HMDSO/O2 plasmas and detected emission lines and bands related to CO, CO2+, OH, CH, H, H2, O, N2 as an impurity and Ar as an actinometer. We have observed only very low emission of Si and SiO. With increasing rf power the increasing concentration of electrons probably caused increasing intensity of emission. This was confirmed for the concentration of oxygen radicals by actinometry. The changes of HMDSO fraction have much more significant influence on the gas phase composition. The oxygen containing molecules (CO, OH) show the same trend on the HMDSO fraction with a maximum at 0.16. The CH and H species show also similar trends to each other with the maximum at 0.28. It is interesting to notice that this trend was not observed for H2 molecule which intensity increase constantly with the HMDSO fraction. The oxygen atomic line, on the other hand, decreased. |
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