UV light enhanced oxidation of a-C:H thin film in air: A study of thickness reduction

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Authors

VALTR Miroslav KLAPETEK Petr OHLÍDAL Ivan FRANTA Daniel

Year of publication 2007
Type Article in Periodical
Magazine / Source Optoelectronics and Advanced Materials - Rapid Communications
MU Faculty or unit

Faculty of Science

Citation
Web http://inoe.inoe.ro/oam-rc/
Field Plasma physics
Keywords Amorphous carbon;Thin film;Optical properties;a-C:H;UV enhanced oxidation;Reflectance spectra
Description UV light enhanced oxidation of a-C:H thin film in air: A study of thickness reduction.
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