DEPOSITION OF THIN FILMS IN ATMOSPHERIC PRESSURE GLOW DISCHARGE IN N2 + HMDSO + O2 ATMOSPHERE

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Authors	STUDNIČKA Filip TRUNEC David SŤAHEL Pavel BURŠÍKOVÁ Vilma KELAR Lukáš
Year of publication	2008
Type	Article in Periodical
Magazine / Source	Chemické Listy, II Central European Symposium on Plasma Chemistry 2008
MU Faculty or unit	Faculty of Science
Citation
Field	Plasma physics
Keywords	plasma deposition
Description	THIN FILMS WERE DEPOSITED IN ATMOSPHERIC PRESSURE GLOW DISCHARGE IN N2 + HMDSO + O2 ATMOSPHERE. THE HARDNESS OF THESE FILMS WAS INCREASED IN COMPARISON WITH FILMS DEPOSITED IN N2 + HMDSO ATMOSPHERE.
Related projects:	Deposition of thin films in dielectric barrier discharges at atmospheric pressure