Modelling of surface processes taking place during reactive magnetron sputtering deposition process with simultaneous adding of hydrogen and oxygen

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Authors	SCHMIDTOVÁ Tereza VAŠINA Petr
Year of publication	2009
Type	Article in Proceedings
Conference	Book of Abstracts, Frontiers in Low Temperature Plasma Diagnostics 8
MU Faculty or unit	Faculty of Science
Citation
Field	Plasma physics
Keywords	modelling; magnetron
Description	Modelling of surface processes taking place during reactive magnetron sputtering deposition process with simultaneous adding of hydrogen and oxygen, procceding
Related projects:	Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface Study of hybrid deposition process and its application for thin film deposition