Deposition of Yarrowia lipolytica on plasma prepared teflonlike thin films

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Authors

LEHOCKY Marian AMARAL PFF SŤAHEL Pavel COELHO MAZ BARROS-TIMMONS AM COUTINHO JAP

Year of publication 2008
Type Article in Periodical
Magazine / Source SURFACE ENGINEERING
MU Faculty or unit

Faculty of Science

Citation
Field Biophysics
Keywords Deposition Yarrowia lipolytica plasma thin films
Description The adhesion of Yarrowia lipolytica to teflonlike thin films deposited by plasma on polycarbonate substrates was investigated through a series of tests in order to develop a substrate for strong and selective adhesion of Yarrowia lipolytica cells. Teflonlike thin films were prepared using atmospheric pressure surface barrier discharge with mixtures of octafluorocyclobutane (C4F8) and nitrogen as plasma gas. A variety of plasma gas feedrates and different deposition times were studied. The films were characterised by Fourier transform infrared and contact angle measurements using the sessile drop technique. Total surface energy and its components were calculated using the acid base theory. Attachment of the yeast cells was assessed by optical and scanning electron microscopy. The optimal deposition conditions for cell adhesion were determined using standard adhesion tests.
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