Composition and functional properties of organosilicon plasma polymers from hexamethyldisiloxane and octamethylcyclotetrasiloxane

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Authors

ZAJÍČKOVÁ Lenka KUČEROVÁ Zuzana BURŠÍKOVÁ Vilma FRANTA Daniel PEŘINA Vratislav MACKOVÁ Anna

Year of publication 2008
Type Article in Proceedings
Conference ORGANIC/INORGANIC HYBRID MATERIALS - 2007
MU Faculty or unit

Faculty of Science

Citation
Field Plasma physics
Keywords THIN-FILMS; HYBRID; DEPOSITION; SILICA; MODEL
Description Hybrid organic-inorganic thin films with different fractions of silicon oxide were deposited in rf capacitively coupled discharges using pure hexamethyldisiloxane (HMDSO), octamethylcyclotetrasiloxane (D4) or 5 % HMDSO in O-2. The deposition in continuous wave (cw) mode was compared with pulsed conditions under which the discharge on-time was 5 ms and the off-time varied from 0.5 to 15 ms. The chemical composition of the films was studied by FTIR, RBS and ERDA. Their optical properties in UV/visible/NIR were determined from spectroscopic ellipsometry and reflectance measurements fitted with a Kramers-Kronig consistent dispersion model based on a parametrization of density of states. Film hardness and reduced modulus were determined from depth sensing indentation tests.
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