Towards limits of x-ray specular reflectivity

Warning

This publication doesn't include Faculty of Arts. It includes Faculty of Science. Official publication website can be found on muni.cz.

Authors	JÍŠA Jan MEDUŇA Mojmír
Year of publication	2009
Type	Article in Periodical
Magazine / Source	Materials Structure in Chemistry, Biology, Physics and Technology
MU Faculty or unit	Faculty of Science
Citation
Field	Solid matter physics and magnetism
Keywords	x-ray reflectivity; fourier transform; photoresist
Description	Using the high resolution diffractometer we have successfully measured photoresist layers more than 1 um thick by x-rays. The thicknesses obtained by x-ray reflectivity correspond well to the ones obtained by optical reflection.
Related projects:	Physical and chemical properties of advanced materials and structures Nucleation and growth of oxygen precipitates in silicon