Impact of neutral gas temperatures on reactive magnetron sputtering

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Authors	SCHMIDTOVÁ Tereza VAŠINA Petr
Year of publication	2010
Type	Article in Proceedings
Conference	Potential and Applications of Thin Ceramic and Metal Coatings
MU Faculty or unit	Faculty of Science
Citation
Field	Plasma physics
Keywords	magnetron sputtering; modelling; temperature; hysteresis
Description	Temperature is an important parameter which influences whole sputtering process. A model of reactive magnetron sputtering was used to investigate an effect of different temperatures in reactor during reactive sputtering on a hysteresis behaviour of the sputtering. We report shifts of transitions between two modes of a reactive sputtering process.
Related projects:	Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface Study of hybrid deposition process and its application for thin film deposition Plazmochemické procesy a jejich technologické aplikace