Behaviour of hybrid PVD-PECVD process of Ti sputtering in argon and acetylene atmosphere

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Authors	SCHMIDTOVÁ Tereza VAŠINA Petr
Year of publication	2010
Type	Article in Proceedings
Conference	Potential and Applications of Nanotretment of Medical Surface
MU Faculty or unit	Faculty of Science
Citation
Field	Plasma physics
Keywords	magnetron sputtering; modelling; hybrid process; hysteresis
Description	Hybrid PVD-PECVD sputtering process was studied for the case of titanium target sputtering in argon and acetylene atmosphere. The hybrid PVD-PECVD process combines aspects of conventional sputtering of metal target with hydrocarbon vapour as a source of carbon. We present and discuss significant differences between behaviour of conventional reactive magnetron sputtering and such hybrid process.
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