Suppressed hysteresis behaviour of Ti sputtering in acetylene gas

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Authors	SCHMIDTOVÁ Tereza VAŠINA Petr ELIÁŠ Marek
Year of publication	2010
Type	Conference abstract
MU Faculty or unit	Faculty of Science
Citation
Description	Suppressed hysteresis behaviour of Ti sputtering in acetylene gas. Modelling of hybrid PVD-PECVD process.
Related projects:	Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface Study of hybrid deposition process and its application for thin film deposition Plazmochemické procesy a jejich technologické aplikace