Application of higher harmonic frequencies generated in RF plasmas for monitoring of deposition processes

Investor logo

Warning

This publication doesn't include Faculty of Arts. It includes Faculty of Science. Official publication website can be found on muni.cz.
Authors

DVOŘÁK Pavel ŽEMLIČKA Radek VAŠINA Petr BURŠÍKOVÁ Vilma

Year of publication 2011
Type Conference abstract
MU Faculty or unit

Faculty of Science

Citation
Description Higher harmonic frequencies of discharge voltage or current were analyzed and used for monitoring of various deposition techniques. It was shown that higher harmonics sensitively react on creation of a thin film, which can be used for simple monitoring of plasma processes.
Related projects:

You are running an old browser version. We recommend updating your browser to its latest version.