Project information
Common laboratories for applied plasma physics and plasma chemistry in PřF and PedF MU, VA Brno and ÚFP AV ČR in Prague
- Project Identification
- VS96084
- Project Period
- 7/1996 - 12/2000
- Investor / Pogramme / Project type
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Ministry of Education, Youth and Sports of the CR
- Support to University Research Programmes
- MU Faculty or unit
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Faculty of Science
- prof. RNDr. Jan Janča, DrSc.
- Keywords
- joint laboratory, young scientist, plasmachemistry, chemical kinetics, hard materials, PECVD, protective coatings, high-pressure discharge, ignition of poor mixtures, removal of toxic waste
The goal of the project is to create joint laboratories which will permit young scientific staff of Fac. of Sciences, MU, Fac. of Pedagogy, MU, Military Academy and Institute of Plasma Physics of AS to participate in the research (collaboration since 199) supported by three grants of the Grant Agency of Czech Republic.The research will be focused on studies of kinetics of plasmachemicalreactions and processes, mainly those involved during deposition of thin films (layers of hard and superhard materials,optically transparent oxinitride and oxicarbide layers, ceramic and polymeric layers based on organometals). The inherent part of the research will be the determination of electrical, mechanical and optical properties of these materials. New means ofignition of very poor mixtures in combustion engines using high-pressure gliding discharge will be developed. Research and development of new plasmachemical devices and technologies, capable of removal of highly toxic wastes, produced by the Army.
Publications
Total number of publications: 55
2000
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Influence of admixtures on production rate of atomic nitrogen
Czechoslovak Journal of Physics, year: 2000, volume: 50-S3, edition: 50-S3
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Influence of Discharge Parameters on Composition of Films Deposited by PECVD from Hexamethyldisiloxane/Oxygen Mixtures
Abstracts of Invited Lectures and Contributed Papers, XVth Europhysics Conference on Atomic and Molecular Physics of Ionized Gases, year: 2000
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Low Pressure Plasma Treatment of Polycarbonate
Electrophysical and Thermophysical Processes in Low-Pressure Plasma, year: 2000
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Matrix formalism for imperfect thin films
Acta physica slovaca, year: 2000, volume: 50, edition: 4
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Optical diagnostics of inductively coupled RF discharge during deposition of nanocomposite CNx/SiOy films
Proceedings of 20th Summer School and International Symposium on the Physics of Ionized Gases, year: 2000
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Optical characterization of inhomogeneous thin films of ZrO2 by spectroscopic ellipsometry and spectroscopic reflectometry
Surface and Interface Analysis, year: 2000, volume: 30, edition: 1
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Optical characterization of thin films with randomly rough boundaries using the photovoltage method
Thin Solid Films, year: 2000, volume: 366, edition: 1
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Plasma enhanced chemical vapor deposition of silicon incorporated diamond-like carbon films
Abstracts of Invited Lecturers and Contributed Papers ,XVth Europhysics Conference on Atomic and Molecular Physics of Ionized Gases, year: 2000
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Plasma Pencil - New Small Scale Source for Atmospheric Surface Modification
Czechoslovak Journal of Physics, year: 2000, volume: 50, edition: S3
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Plasma Surface Treatment of Textile Fibres for Improvement of Car Tires
Czechoslovak Journal of Physics, year: 2000, volume: 50, edition: S3