Plasma enhanced chemical vapor deposition of silicon incorporated diamond-like carbon films

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Authors	BURŠÍKOVÁ Vilma ZAJÍČKOVÁ Lenka DVOŘÁK Pavel SUBEDI Deepak Prasad JANČA Jan
Year of publication	2000
Type	Article in Proceedings
Conference	Abstracts of Invited Lecturers and Contributed Papers ,XVth Europhysics Conference on Atomic and Molecular Physics of Ionized Gases
MU Faculty or unit	Faculty of Science
Citation
Field	Plasma physics
Keywords	PECVD; Diamond-like Carbon; Protective thin films; Silicon doping;
Description	Deposition of diamond like films with an incorporation of silicon by plasma enhanced CVD technique from mixture of methane, argon and hexamethyldisiloxane (HMDSO). Study of the influence of the percentage of HMDSO in the mixture on film properties.
Related projects:	Common laboratories for applied plasma physics and plasma chemistry in PřF and PedF MU, VA Brno and ÚFP AV ČR in Prague Study of plasmachemical reactions in non-isothermic low pressure plasma and its interaction with the surface of solid substrates