Influence of hydrogen on behaviour of reactive magnetron sputtering
| Authors | |
|---|---|
| Year of publication | 2012 |
| Type | Article in Proceedings |
| Conference | Potential and Applications of Surface Nanotreatment of Polymers and Glass: Book of Extended Abstracts |
| MU Faculty or unit | |
| Citation | |
| Field | Plasma physics |
| Keywords | reactive magnetron sputtering; hydrogen |
| Description | This work studies reactive magnetron sputtering in mixtures of the gases Ar, O2 and H2. The main part is formed by analyzes the hysteresis of the deposition process for the mixtures Ar+O2, Ar+H2 separately and comparison of the results with behaviour of the system for the Ar+O2+H2 mixture. Behaviour of the system is studied for the case of deposition titanium oxide layer. |
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