PECVD of nanostructured SiO2 in a modulated microwave plasma jet at atmospheric pressure

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Authors

HNILICA Jaroslav SCHÄFER Jan FOEST Rüdiger ZAJÍČKOVÁ Lenka KUDRLE Vít

Year of publication 2013
Type Article in Periodical
Magazine / Source J. Phys. D: Appl. Phys.
MU Faculty or unit

Faculty of Science

Citation
Web http://iopscience.iop.org/0022-3727/46/33/335202/
Doi http://dx.doi.org/10.1088/0022-3727/46/33/335202
Field Plasma physics
Keywords PECVD; modulated; microwave; plasma jet; atmospheric pressure
Attached files
Description We performed the thin films deposition using atmospheric pressure plasma enhanced chemical vapour deposition (AP-PECVD) by means of a microwave plasma jet operating with mixtures of argon and tetrakis(trimethylsilyloxy)silane (TTMS).
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