Enhanced permeability dielectric thin films with tailored properties deposited by magnetron sputtering on silicon

Warning

This publication doesn't include Faculty of Arts. It includes Faculty of Science. Official publication website can be found on muni.cz.

Authors	FALUB Claudiu V. PIETAMBARAM Srinivas V. YILDIRIM Oguz MEDUŇA Mojmír CAHA Ondřej HIDA Rachid ZHAO Xue AMBROSINI Jan ROHRMANN Hartmut HUG Hans J.
Year of publication	2019
Type	Article in Periodical
Magazine / Source	AIP Advances
MU Faculty or unit	Faculty of Science
Citation
Web	Full Text
Doi	http://dx.doi.org/10.1063/1.5079477
Keywords	Magnetic hysteresis; Metal oxides; X-ray diffraction; Magnetron sputtering; X-ray reflectivity; X-ray fluorescence
Description	We have studied the structural and magnetic properties of enhanced-permeability-dielectric (EPD) FeCo/Al2O3-multilayer thin films deposited on 8”-Si wafers in an industrial magnetron sputtering system.
Related projects:	CEITEC Nano CEITEC 2020