Characterization of CNx/SiOy Films Prepared by the Inductively Coupled RF Discharge

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Authors	ELIÁŠ Marek ZAJÍČKOVÁ Lenka BURŠÍKOVÁ Vilma JANČA Jan
Year of publication	2000
Type	Article in Periodical
Magazine / Source	Czechoslovak Journal of Physics
MU Faculty or unit	Faculty of Science
Citation
Field	Plasma physics
Description	Characterization of CNx/SiOy thin films prepared in the inductively coupled radio-frequency discharge.
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