Deposition of nanocomposite CNx/SiO films in inductively coupled r.f. discharge
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Year of publication | 2000 |
Type | Article in Periodical |
Magazine / Source | Diamond and Related Materials |
MU Faculty or unit | |
Citation | |
Field | Plasma physics |
Keywords | Carbon; Ellipsometry; Nitrides; Mechanical properties |
Description | Nanocomposite CNx/SiO thin films |
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