Thermal stability of SiOxCyHz films prepared by PECVD

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Authors

KUČEROVÁ Zuzana BURŠÍKOVÁ Vilma ZAJÍČKOVÁ Lenka FRANCLOVÁ Jana PEŘINA Vratislav

Year of publication 2005
Type Article in Periodical
Magazine / Source Chemické listy
MU Faculty or unit

Faculty of Science

Citation
Field Plasma physics
Keywords thermal stability; TDS; PECVD; FTIR; RBSW; ERDA
Description Thermal stability of SiOxCyHz films prepared using PECVD was studied by TDS, FTIR, RBS, ERDA and spectroscopic elipsometry.
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