Influence of the pulse duration of fast high power magnetron discharge on the amount of ion collected on the substrate
| Authors | |
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| Year of publication | 2005 |
| Type | Article in Proceedings |
| Conference | Proceeding of 27th International Conference on Phenomena in Ionised Gases |
| MU Faculty or unit | |
| Citation | |
| Field | Plasma physics |
| Keywords | magnetron sputtering; plasma diagnostics; pulsed discharge |
| Description | In this paper, we report the influence of the various stages of the preionized high power pulsed magnetron discharge on the saturated ion substrate holder current. A home made system allows superposition of low preionisation current with high voltage pulses. The preionisation establishes a low density plasma near the magnetron cathode before applying each high power pulse. The pulse duration was varied from 1.5 ľs up to 8 ľs by 0.5 ľs step. It allows us to obtain the influence of each 0.5 ľs phase of magnetron pulse on the substrate holder current. The repetition frequency (5 Hz) is chosen very low to avoid the coupling between two successive pulses. For Ar pressure of ~ 1 Pa, voltage ~ 1 kV applied on a cathode, the maximum current of ~ 40 A is reached in 6 ľs. For a 33 mm copper target, the high power sputtering by argon ions passes very quickly to the stable self-sputtering regime through a short time transient regime. In the first regime, the total amount of ions arriving to the substrate varies nonlinearly with the total amount of the ions bombarding the cathode during one pulse. However, in self-sputtering regime, linear dependence is reached. |
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