Adhesion of Rhodococcus sp. S3E2 and Rhodococcus sp. S3E3 to plasma prepared Teflon-like and organosilicon surfaces

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Authors	LEHOCKÝ Marian SŤAHEL Pavel KOUTNÝ Marek ČECH Jan INSTITORIS Jakub MRÁČEK Aleš
Year of publication	2008
Type	Article in Periodical
Magazine / Source	Journal of Materials Processing Technology
MU Faculty or unit	Faculty of Science
Citation
Field	Plasma physics
Keywords	Rhodococcus; Plasma deposition; Cell adhesion; Barrier discharge; Thin films
Description	Investigation of Rhodococcus SP.S3E2 and Rhodococcus SP.S3E3 adhesion to hydrophobic teflon like films and organosilicon films deposited on the paper substrate.
Related projects:	Plasmachemical modification of natural polymers based on cellulose in atmospheric pressure surface or coplanar barrier discharge Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface