Plasma treatment of silicon surface
| Authors | |
|---|---|
| Year of publication | 2010 |
| Type | Article in Proceedings |
| Conference | Potential and Applications of Thin Ceramic and Metal Coatings |
| MU Faculty or unit | |
| Citation | |
| Field | Plasma physics |
| Keywords | silicon surface - dielectric barrier discharge - plasma treatment |
| Description | The contribution focuses on the plasma treatment of crystalline silicon surface. The plasma was generated by Diffuse Coplanar Surface Barrier Discharge (DCSBD) at atmospheric pressure in an ambient air. By means of the contact angle measurements surface free energy was studied an by atomic force microscope (AFM) the surface roughness of silicon before and after plasma treatment was investigated. |
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