Behaviour of Hybrid PVD-PECVD in Comparison with Conventional Reactive Magnetron Sputtering.

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Authors	SCHMIDTOVÁ Tereza VAŠINA Petr
Year of publication	2010
Type	Conference abstract
MU Faculty or unit	Faculty of Science
Citation
Description	Behaviour of Hybrid PVD-PECVD Process in Comparison with Conventional Reactive Magnetron Sputtering. Modelling of hybrid PVD-PECVd process.
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