Structural and defect changes of hydrogenated SiGe films due to annealing up to 600°C

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Publikace nespadá pod Filozofickou fakultu, ale pod Přírodovědeckou fakultu. Oficiální stránka publikace je na webu muni.cz.
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SLÁDEK Petr BURŠÍKOVÁ Vilma SŤAHEL Pavel

Rok publikování 2010
Druh Článek v odborném periodiku
Časopis / Zdroj physica status solidi (c)
Fakulta / Pracoviště MU

Přírodovědecká fakulta

Citace
www http://www.pss-c.com
Obor Fyzika pevných látek a magnetismus
Klíčová slova SiGe; thin films; deposition conditions; structure; lattice properties
Popis In order to better understand the effects of the hydrogen incorporation on the defects and the disorder in the undoped nano/microcrystalline SiGe:H, we performed a comparative study on samples deposited under different plasma conditions. With variation of the pressure, we were able to change the structure of SiGe:H films. We have used the combination of the infrared spectroscopy, CPM, PDS and thermal desorption measurements to study the thermal dependence of defect density, disorder, as well as hydrogen concentration. The film mechanical properties were tested by depth sensing indentation technique. The results showing a different hydrogen bonding with the change of deposition conditions are interpreted as a whole by terms of the specific local hydrogen bonding environment, related to different growth mechanism.
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