Project information
Pokročilé směry ve fyzice a chemii plazmatu
- Project Identification
- GD202/03/H162
- Project Period
- 1/2003 - 12/2007
- Investor / Pogramme / Project type
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Czech Science Foundation
- Doctor grants
- MU Faculty or unit
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Faculty of Science
- prof. RNDr. Jan Janča, DrSc.
- Keywords
- plasma physics, plasma diagnostics, plasma modelling, high-frequency discharges, barrier discharges, plasma deposition, plasma chemistry
- Cooperating Organization
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Institute of Plasma Physics of the ASCR, v. v. i.
- Responsible person RNDr. Jan Stöckel, CSc.
- Responsible person Prof. RNDr. Jana Šafránková, DrSc.
- Responsible person prof. RNDr. František Krčma, Ph.D.
- Responsible person prof. RNDr. Pavel Kubeš, CSc.
Publications
Total number of publications: 40
2005
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Characterisation of nitrogen-oxygen flowing afterglow
Abstracts and full papers CD of 17th International Symphosium on Plasma Chemistry, year: 2005
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Influence of the pulse duration of fast high power magnetron discharge on the amount of ion collected on the substrate
Proceeding of 27th International Conference on Phenomena in Ionised Gases, year: 2005
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Investigation of High Power Pulsed Microwave Discharge
Abstracts of Frontiers in Low Temperature Plasma Diagnostics VI, year: 2005
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Ionized physical vapor deposition by high power fast pulsed magnetron discharge
Actes du workshop Nouveaux oxydes a forte permittivite dans l integration des semi-conducteurs, year: 2005
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Modeling of high power pulsed microwave discharge
Abstracts and full paper CD of 17th International Symphosium on Plasma Chemistry, year: 2005
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Preionised pulsed magnetron discharges for ionised physical vapour deposition
Journal of Optoelectronics and Advanced Materials, year: 2005, volume: 7, edition: 5
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Reduction of transient regime in fast preionized high power pulsed magnetron discharge
Europhysics Letters, year: 2005, volume: 72, edition: 3
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Role of Oxygen Admixture on Nitrogen Afterglow
Book of Contributed Papers of 15th Symphosium on Applications on Plasma Processes and 3rd EU-Japan Joint Symphosium on Plasma Processing, year: 2005
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Spatial characterization of an IPVD reactor: neutral gas temperature and interpretation of optical spectroscopy measurements
Plasma Sources Science and Technology, year: 2005, volume: 14, edition: 2
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Spatially resolved probe measurements in hydrogen rf discharges
Proceedings of the 14th Annual Conference of Doctoral Students - WDS 2005, year: 2005